Summary

  • Chinese scientists have created the world’s fastest transistor at Peking University, surpassing previous silicon-based designs.
  • The new transistor is a GAAFET (Gate-All-Around Field-Effect Transistor) and is constructed from bismuth oxyselenide for the channel, and bismuth selenite oxide as the gate material.
  • Transistors are the key component in transistors and previous designs have struggled to keep up with the demands of modern technology, with a limit on how small they can currently be created.
  • This new transistor uses new materials and a new design to achieve both faster switching and lower power consumption at denser sizes.
  • It is speculated that the new transistor could be used in the development of quantum computers.
  • This is the latest in a series of scientific advances in China that have drawn attention away from counterparts in Western nations.
  • It is not clear when, or if, the new transistor will be available commercially.

By John Elliot V

Original Article